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China QIII Surface Particle Counter - China Supplier
China QIII Surface Particle Counter - China Supplier China QIII Surface Particle Counter - China Supplier China QIII Surface Particle Counter - China Supplier China QIII Surface Particle Counter - China Supplier China QIII Surface Particle Counter - China Supplier

QIII Surface Particle Counter

Price:Negotiable
Industry Category: Instruments & Meters/Electronic Measuring Instruments/Spectrum Analyzers
Product Category:
Brand:
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Contact Info
  • Add:蘇州市吳江經(jīng)濟(jì)開發(fā)區(qū)江陵街道聯(lián)興村渡船橋花苑東區(qū)23號, Zip: 215216
  • Contact: 高新
  • Tel:13776141586
  • Email:2319039989@qq.com

Other Products

Description
Additional Information

QIII Surface Particle Counter Surface Cleanliness Analyzer


Product Description

Surface particle density verification surface particle density analyzer (surface cleanliness verification) and product documentation
Surface particle density analysis counter
US Pentagon QIII max (0.3μm) and QIII Ultra (0.1μm)
Surface particle counter product catalog, an essential verification tool for surface particle detection that gains recognition from your company's clients.
For your reference. We are the general distributor for Pentagon in China.


QIII Max/Ultra Updated Features:
1. New sampling mode improves accuracy
2. 7" 800X480 large touch screen (QIII+ 6" touch screen)
3. Improved sampling probe socket for easy plugging and replacement
4. Two user-replaceable battery sockets with hot-swappable capability (comes with 2 standard batteries; charger optional)
5. Data download via USB
6. QIII Ultra can measure down to 0.1 Micron
Detailed particle size distribution for QIII Max & QIII Ultra:
QIII Max QIII Ultra
0.3μm 0.1μm
0.5μm 0.2μm
1.0μm 0.3μm
3.0μm 0.5μm
5.0μm 1.0μm
10.0μm 5.0μm


Product Advantages: Suitable for organizations complying with: IEST-CC-1246D, ISO14644-9,
1. Target customers: Semiconductor lithography, etching processes, parts cleaning suppliers, equipment cleaning and maintenance, optoelectronics plants, glass substrate manufacturers, etc.
2. Capture filter collects particles for composition analysis via EDX or FTIR.
3. Suitable for: PVD, CVD, Photo, Ion Plant, YE, QA, QC, Micronization, Etch, Diffusion...
4. Highly effective for exposure machines, developers, etching equipment, lithography, and polarizer attachment machines
QIII+, QIII ultra, QIII max, QIII LS,
QIII ST, QIII SM, QIII SX,
Sterile medical device primary packaging cleanliness
T/CAMDI 009.1-2020
Particulate contamination test method — Gas blow-off method
Coating workshop "Cleanliness New Standard — ISO14644-9

Main Markets: Semiconductor lithography, etching processes, parts cleaning suppliers, equipment cleaning and maintenance, optoelectronics plants, glass substrate manufacturers, etc.




Industry Category Instruments & Meters/Electronic Measuring Instruments/Spectrum Analyzers
Product Category
Brand:
Spec:
Stock:
Origin: China / Jiangsu / Suzhoushi
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