Silicon carbide cantilever paddles, rods, and silicon carbide diffusion paddles. Design features: 1. No deformation in high-temperature environments, with high wafer loading capacity; 2. Resistant to extreme cold and rapid heat, with a long service life; 3. Extremely low thermal expansion coefficient of the cantilever paddle, extending the maintenance and cleaning cycle, and significantly reducing contaminants. Used in diffusion furnaces for the (diffusion) coating process of polysilicon or monocrystalline silicon wafers, providing support and transportation for wafers in high-temperature environments (1000–1300°C). They are key components of semiconductor wafer loading systems. Standard sizes include 2378 mm, 2550 mm, 2660 mm, etc.