Nitrogen trifluoride
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Product Category: Nitrogen Trifluoride
Name/Chemical Formula: Nitrogen Trifluoride/NF3
Packaging Specifications: 44L, 17L
Purity (%) and Impurities (ppm): 99.99%
Product Details
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| Name: Nitrogen Trifluoride Molecular Formula: NF3 | |||||||||||||||||||||||||||||||||||||||||||||||||||
| Gas Physical and Chemical Properties | |||||||||||||||||||||||||||||||||||||||||||||||||||
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| Nitrogen trifluoride cylinders should be stored in a cool, well-ventilated warehouse. Keep away from ignition sources, heat sources, and direct sunlight. Store separately from reducing agents, flammable or combustible materials. | |||||||||||||||||||||||||||||||||||||||||||||||||||
| Handle nitrogen trifluoride cylinders with care during transportation to prevent damage to the cylinder and accessories. | |||||||||||||||||||||||||||||||||||||||||||||||||||
| Transport nitrogen trifluoride cylinders as hazardous materials. Secure the cylinders with cylinder fixing racks for road transport by truck or container transport by ship. | |||||||||||||||||||||||||||||||||||||||||||||||||||
| Emergency Leak Handling | |||||||||||||||||||||||||||||||||||||||||||||||||||
| In case of nitrogen trifluoride gas leakage, personnel should immediately evacuate the contaminated area and take measures to stop further leakage. If personnel are poisoned, seek medical attention immediately. | |||||||||||||||||||||||||||||||||||||||||||||||||||
| The leak site should be handled as soon as possible. Personnel handling the leak must wear necessary anti-toxic equipment, preferably self-contained positive pressure respirators. Personnel may only enter the leak site after testing confirms no hazardous gases. Leaking containers must be carefully inspected, repaired, or properly handled before reuse. | |||||||||||||||||||||||||||||||||||||||||||||||||||
| Nitrogen Trifluoride Gas Product Quality Standards (QJ58-2007) | |||||||||||||||||||||||||||||||||||||||||||||||||||
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Main Uses of Nitrogen Trifluoride (NF3)
It is used as a fluorine source in hydrogen fluoride-fluorine gas high-energy chemical lasers. Approximately 25% of the reaction energy between H2-O2 and F2 can be released as laser radiation, making HF-OF lasers one of the most promising chemical lasers. Nitrogen trifluoride is an excellent plasma etching gas in the microelectronics industry. For etching silicon and silicon nitride, NF3 offers higher etching rates and selectivity compared to carbon tetrafluoride and mixtures of carbon tetrafluoride with oxygen, without surface contamination. Especially for integrated circuit materials with thicknesses less than 1.5μm, NF3 provides excellent etching rates and selectivity, leaving no residues on the etched surface. It is also an effective cleaning agent.
Used as a high-energy fuel.
Current Industrial Production of Nitrogen Trifluoride
There are two production routes: one is the synthesis method, where ammonium hydrogen fluoride is heated in a nickel reactor, and fluorine, nitrogen, and ammonia are introduced through distributors for direct fluorination. The other is the electrolysis method, where molten ammonium hydrogen fluoride is electrolyzed at a certain temperature, producing nitrogen trifluoride at the anode and hydrogen at the cathode. Production methods used by Chinese NF3 manufacturers include these two approaches.
| Industry Category | Chemicals |
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| Product Category | |
| Brand: | 尚瀾特氣 |
| Spec: | |
| Stock: | 9999 |
| Manufacturer: | |
| Origin: | China / Shanghai / Fengxianqu |
