2-target RF DC magnetron sputtering PVD coating device
Contact Info
- Add:No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, , Henan, China, Zip: 450000
- Contact: jibin wang
- Tel:86 371 5519 9322
- Email:wjb@cykeyi.com
Other Products
Dual-target magnetron sputtering coater (with RF&DC power supply) TN-MSP300S-RFDC
Dual-target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with a 500W DC power supply and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.
Dual-target magnetron sputtering coater application:
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Dual-target magnetron sputtering coater technical parameters:
|
Sample stage |
Size |
φ185mm |
Temperature control accuracy |
±1℃ |
|
Heating temperature |
Max 500℃ |
Rotate speed |
1-20rpm adjustable |
|
|
Magnetron Sputtering target head |
Quantity |
2”×2 (1”,2” optional) |
Water chiller |
Circulating water chiller with flow rate of 10L/min |
|
Cooling mode |
Water cooling |
|
|
|
|
Vacuum chamber |
Chamber size |
φ300mm×300mm |
Watch window |
φ100mm |
|
Chamber material |
Stainless steel |
Opening mode |
Top cover open |
|
|
Mass flowmeter |
2 channels; measuring range 100SCCM; 100SCCM (can be customized according to customer needs) |
|||
|
Vacuum system |
Model |
TN-GZK103-A |
Pumping interface |
KF40 |
|
Molecular pump |
TN-600 |
Exhaust interface |
KF16 |
|
|
Backing pump |
rotary vane pump |
Vacuum measurement |
Compound vacuum gauge |
|
|
Ultimate vacuum |
1.0E-5Pa |
Power supply |
AC;220V 50/60Hz |
|
|
Pumping rate |
Molecular pump: 600L/S rotary vane pump: 1.1L/S Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes |
|||
|
Power configuration |
Quantity |
DC power supply×1 RF power supply×1 |
Max output power |
DC 500W, RF 300 W |
|
Other parameters |
Supply voltage |
AC220V,50Hz |
Overall size |
600mm×650mm×1280mm |
|
Total power |
2.5KW |
Total Weight |
About 300kg |
|
Chat Now
东平县|
芜湖市|
宜州市|
南乐县|
黄石市|
邢台县|
延安市|
紫阳县|
固阳县|
延庆县|
宁强县|
吴桥县|
南投县|
噶尔县|
霍城县|
石棉县|
剑河县|
淮南市|
博兴县|
扶风县|
安塞县|
苏尼特左旗|
土默特左旗|
睢宁县|
白河县|
拜泉县|
濮阳市|
湾仔区|
垦利县|
钟祥市|
林芝县|
温州市|
额济纳旗|
浪卡子县|
青州市|
宁阳县|
嘉义市|
屏山县|
兰西县|
佛冈县|
贵州省|