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China ラボデスクトップシングルターゲット真空マグネトロンDCスパッタリングpvdコーター - China Supplier
China ラボデスクトップシングルターゲット真空マグネトロンDCスパッタリングpvdコーター - China Supplier

ラボデスクトップシングルターゲット真空マグネトロンDCスパッタリングpvdコーター

価格:交渉可能な
業(yè)界カテゴリ: Hardware & Tools/Other Bench Tools
製品カテゴリ: magnetron sputtering coating
ブランド: TN
仕様: TN-MSP180G-DG


Contact Info
  • 住所:No. 820, 8th Floor, 1st Unit, 9th Block, Cuizhu Street, High-Tech Zone, , Henan, China, Zip: 450000
  • 接觸する: jibin wang
  • 電話番號(hào):86 371 5519 9322
  • 電子メール:wjb@cykeyi.com

その他の製品

説明
追加情報(bào)

Small desktop single-target DC magnetron sputtering coater CY-MSP180G-DG

 Small desktop single-target DC magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It has the characteristics of miniaturization and standardization.

  1. The magnetron target head has 1 inch and 2 inches to choose from. Customers can choose the target according to the size of the substrate to be plated.

  2. The device is equipped with 150W DC power supply, which can be used for metal sputter coating.

  3. The coating machine is equipped with gas inlet port for the introduction of protective gas. If the customer needs the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.

  4. The instrument is equipped with advanced turbomolecular pump set, the ultimate vacuum is up to 1.0E-5pa, and other types of molecular pumps are also available.

Small desktop single-target DC magnetron sputtering coater application:

The device can be used to prepare single-layer ferroelectric thin films, conductive films, alloy films, and so on. Compared with similar equipment, the single-target magnetron sputtering coater is compact, highly integrated and small in size, and can be placed on a desktop. It is an ideal equipment for laboratory preparation of material films.

Small desktop single-target DC magnetron sputtering coater technical parameters:

Sample stage

Size

φ138mm

Temperature control accuracy

±1

Heating temperature

Max 500

Rotate speed

1-20rpm adjustable

Magnetron Sputtering target head

Quantity

2”×1 (1”,2” optional)

Water chiller

Circulating water chiller with flow rate of 10L/min

Cooling mode

Water cooling

 

 

Vacuum chamber

Chamber size

φ180mm×215mm

Watch window

Omnidirectional transparent

Chamber material

High purity quartz

Opening mode

Top cover removable

Vacuum system

Model

CY-GZK103-A

Pumping interface

KF40

Molecular pump

CY-600

Exhaust interface

KF16

Backing pump

rotary vane pump

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum

1.0E-5Pa

Power supply

AC;220V 50/60Hz

Pumping rate

Molecular pump: 600L/S    rotary vane pump: 1.1L/S 

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

Quantity

DC power supply x1

Max output power

150W

Other parameters

Supply voltage

AC220V,50Hz

Overall size

500mm×350mm×400mm

Total power

1.7KW (Vacuum pump1.5KW+machine0.2KW)

Total Weight

About 30kg

業(yè)界カテゴリ: Hardware & Tools/Other Bench Tools
製品カテゴリ: magnetron sputtering coating
ブランドBrand: TN
仕様: TN-MSP180G-DG
Stock:
Origin:
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