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China Silicon Mirror: High Reflectivity Laser-Specific, Temperature-Resistant, Corrosion-Resistant, Preferred Optical Component for Industrial and Scientific Research - China Supplier
China Silicon Mirror: High Reflectivity Laser-Specific, Temperature-Resistant, Corrosion-Resistant, Preferred Optical Component for Industrial and Scientific Research - China Supplier China Silicon Mirror: High Reflectivity Laser-Specific, Temperature-Resistant, Corrosion-Resistant, Preferred Optical Component for Industrial and Scientific Research - China Supplier China Silicon Mirror: High Reflectivity Laser-Specific, Temperature-Resistant, Corrosion-Resistant, Preferred Optical Component for Industrial and Scientific Research - China Supplier China Silicon Mirror: High Reflectivity Laser-Specific, Temperature-Resistant, Corrosion-Resistant, Preferred Optical Component for Industrial and Scientific Research - China Supplier

Silicon Mirror: High Reflectivity Laser-Specific, Temperature-Resistant, Corrosion-Resistant, Preferred Optical Component for Industrial and Scientific Research

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Contact Info
  • Address:深圳市坪山區(qū)錦繡中路19號(hào)美訊科技園A棟8樓, Zip:
  • Contact: 范小姐
  • Tel:0755-85209446
  • Email:

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Description
Additional Information

Silicon mirrors are laser-grade mirrors made from monocrystalline or polycrystalline silicon substrates, which undergo ultra-precise polishing and are coated with metal or dielectric multilayer films. They combine high reflectivity, high thermal conductivity, low thermal expansion, lightweight properties, and chemical inertness, making them widely used in laser processing, optical communications, medical applications, scientific research, and space optical systems.

Core Features

  1. High Reflectivity: Gold (Au) film achieves >98% reflectivity in the 2–12 μm wavelength range, silver (Ag) film >97% in the visible to near-infrared region, and dielectric multilayer films can reach up to 99.5% at specific wavelengths (e.g., 1064 nm).

  2. Excellent Thermal Performance: Silicon substrate has a thermal conductivity of 149 W/(m·K), enabling rapid dissipation of laser heat; thermal expansion coefficient of 2.6×10?? /K reduces thermal distortion.

  3. Lightweight and High Strength: Density of 2.33 g/cm3, only one-third that of copper, allowing processing into ultra-thin mirrors as thin as 0.5 mm to reduce inertial load.

  4. Chemical Stability: Silicon surface naturally forms a SiO? passivation layer, resistant to acids, alkalis, and oxidation, suitable for long-term use in high-humidity or vacuum environments.

  5. High Processing Precision: Surface figure accuracy of λ/20 (@633 nm), surface roughness RMS <1 nm, with extremely low scattering; customizable for flat, spherical, aspherical, and freeform surfaces.

  6. High Damage Threshold: When coated with high-power dielectric films, it can withstand laser power densities of up to 15 J/cm2 (1064 nm, 10 ns, 1 Hz).

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